发明名称 |
Method of fabricating self-aligned cross-point memory array |
摘要 |
A method of fabricating a self-aligned cross-point memory array includes preparing a substrate, including forming any supporting electronic structures; forming a p-well area on the substrate; implanting ions to form a deep N<+ >region; implanting ions to form a shallow P+ region on the N<+ >region to form a P+/N junction; depositing a barrier metal layer on the P+ region; depositing a bottom electrode layer on the barrier metal layer; depositing a sacrificial layer or silicon nitride layer on the bottom electrode layer; patterning and etching the structure to remove portions of the sacrificial layer, the bottom electrode layer, the barrier metal layer, the P+ region and the N<+ >region to form a trench; depositing oxide to fill the trench; patterning and etching the sacrificial layer; depositing a PCMO layer which is self-aligned with the remaining bottom electrode layer; depositing a top electrode layer; patterning and etching the top electrode layer; and completing the memory array structure.
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申请公布号 |
US2004063274(A1) |
申请公布日期 |
2004.04.01 |
申请号 |
US20020262222 |
申请日期 |
2002.09.30 |
申请人 |
SHARP LABORATORIES OF AMERICA, INC. |
发明人 |
HSU SHENG TENG;PAN WEI;ZHUANG WEI-WEI |
分类号 |
G11C11/56;G11C13/00;H01L27/10;H01L27/24;(IPC1-7):H01L21/823;H01L21/336;H01L21/476 |
主分类号 |
G11C11/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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