| 摘要 |
A substrate processing apparatus is used to remove an organic matter attached to a substrate with use of a removal liquid. This apparatus includes a process chamber directed to an organic matter removal process, a holding element to hold the substrate in the process chamber, a removal liquid supply element to supply the removal liquid to the substrate held by the holding element, and a light-blocking element disposed in a transport path for the substrate that extends from a cassette housing the substrate and having high transparency, to the process chamber, thereby blocking light passing through the transport path into the process chamber.
|
