WAFER HOLDER AND SYSTEM FOR PRODUCING SEMICONDUCTOR

摘要

A wafer holder in which uniform heating properties of the wafer holding surface are enhanced by suppressing local heat dissipation at the time of holding and heating a wafer, and a system for producing a semiconductor which is made suitable for processing even a wafer of a large diameter using that wafer holder. The wafer holder (1) comprises resistance heaters (3) buried in a ceramic basic body (2), and leads (4) penetrating a reaction container (6), wherein the leads (4) are housed in guide members (5), respectively. The guide members (5) and the reaction container (6) are sealed hermetically and the inside of the guide members (5) is also sealed hermetically. The guide members (5) and the ceramic basic body (2) are not bonded to each other, and the atmosphere on the ceramic basic body (2) side in the internally sealed guide members (5) is substantially identical to that in the reaction container (6).