发明名称 |
METHOD FOR PRODUCING CONTAINING FULLERENE AND APPARATUS FOR PRODUCING SAME |
摘要 |
<p>A method for producing a containing fullerene at a higher yield and an apparatus therefor are disclosed. The apparatus comprises a vacuum vessel (1), means (3, 4) for generating a plasma current (2) of atoms to be contained, means (8) for introducing fullerenes into the plasma current (2), a holding means (6) for holding a plurality of division plates (5a, 5b, 5c) concentrically divided and arranged in the downstream region of the plasma current (2), and a bias-applying means (7a, 7b, 7c) for applying an arbitrary bias voltage to the division plates (5a, 5b, 5c).</p> |
申请公布号 |
WO2004026763(A1) |
申请公布日期 |
2004.04.01 |
申请号 |
WO2003JP12098 |
申请日期 |
2003.09.22 |
申请人 |
IDEAL STAR INC.;HATAKEYAMA, RIKIZO;HIRATA, TAKAMICHI;YOKOH, KUNIYOSHI;KASAMA, YASUHIKO;OMOTE, KENJI |
发明人 |
HATAKEYAMA, RIKIZO;HIRATA, TAKAMICHI;YOKOH, KUNIYOSHI;KASAMA, YASUHIKO;OMOTE, KENJI |
分类号 |
C01B31/02;(IPC1-7):C01B31/02 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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