发明名称 METHOD FOR SUPPORTING SUBSTRATE, SUBSTRATE SUPPORTING APPARATUS AND EXPOSURE APPARATUS
摘要 <p>A substrate supporting apparatus has a supporting member (10), which supports a substrate from below at three or more points (supporting points). The supporting member comprises a pillar (11) extending in the direction of height, a crossbar (13), which horizontally extends from the end of the pillar, and a rubber ring (15) fitted on the crossbar. By vertically arranging the rubber ring (15), the outer surface of the rubber ring is of a convex shape, thereby coming into contact with the substrate at a single point, the uppermost point of the rubber ring. Consequently, no space is formed between the substrate and the rubber ring and thus, no suction-cup phenomenon occurs. Therefore, neither vibration nor positional deviation occurs when the substrate is dismounted.</p>
申请公布号 WO2004027856(A1) 申请公布日期 2004.04.01
申请号 WO2003JP08795 申请日期 2003.07.10
申请人 SENDAI NIKON CORPORATION;NIKON CORPORATION;KIKUCHI, HIDEKAZU 发明人 KIKUCHI, HIDEKAZU
分类号 H01L21/683;G03F7/20;H01J37/20;H01L21/027;H01L21/687;(IPC1-7):H01L21/68 主分类号 H01L21/683
代理机构 代理人
主权项
地址