THERMAL SPRAYED YTTRIA-CONTAINING COATING FOR PLASMA REACTOR
摘要
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack.
申请公布号
WO2004003962(A3)
申请公布日期
2004.04.01
申请号
WO2003US18502
申请日期
2003.06.12
申请人
LAM RESEARCH CORPORATION;O'DONNELL, ROBERT, J.;DAUGHERTY, JOHN, E.
