发明名称 Test structure for determining a region of a deep trench outdiffusion in a memory cell array
摘要 A test structure for determining a doping region of an outer capacitor electrode of a trench capacitor in a memory cell array. The trench capacitors of the memory cell array are arranged in matrix form. The test structure has two parallel rows of trench capacitors. The outer capacitor electrode of each row of trench capacitors is electrically connected to one another and the basic area of at least one trench capacitor of each row is lengthened on the side facing the other row in such a way that the two trench capacitors overlap in a direction transverse to their extent.
申请公布号 US2004061111(A1) 申请公布日期 2004.04.01
申请号 US20030675493 申请日期 2003.09.30
申请人 FELBER ANDREAS;ROSSKOPF VALENTIN 发明人 FELBER ANDREAS;ROSSKOPF VALENTIN
分类号 H01L21/8242;H01L23/544;(IPC1-7):H01L21/66;G01R31/26 主分类号 H01L21/8242
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