发明名称 Semiconductor element structure, electron emitter and method for fabricating a semiconductor element structure
摘要 A mask layer with an opening is formed on a main surface of a silicon substrate, which is exposed in the opening. Then, a hexagonal pyramidal island-shaped portion is formed from a first semiconductor nitride in the opening to complete a semiconductor element structure.
申请公布号 US2004061125(A1) 申请公布日期 2004.04.01
申请号 US20030443970 申请日期 2003.05.23
申请人 NAGOYA UNIVERSITY 发明人 SAWAKI NOBUHIKO;HONDA YOSHIO
分类号 H01J1/304;H01J1/308;H01J9/02;H01L21/205;(IPC1-7):H01L33/00 主分类号 H01J1/304
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