发明名称 |
MASKING MECHANISM FOR FILM-FORMING DEVICE |
摘要 |
<p>A masking mechanism for a film forming device, comprising a mask (11) having a first signal acting edge (11a), a second signal acting edge (11b), and a third signal acting edge (11c) and a drive device for moving the mask (11) in a uniaxial direction (A) relative to a substrate (12), wherein three-component thin-films having film thickness gradient directions equally spaced by 120°are overlapped on each other by depositing deposited substances for the edges in a same substrate area while the mask (11) is being moved at a specified speed in the uniaxial direction (A) to form a thin-film (13) with a ternary phase diagram.</p> |
申请公布号 |
WO2004027107(A1) |
申请公布日期 |
2004.04.01 |
申请号 |
WO2003JP11950 |
申请日期 |
2003.09.19 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY CORPORATION;KOINUMA, HIDEOMI;YAMAMOTO, YUKIO;MATSUMOTO, YUJI;TAKAHASHI, RYOTA |
发明人 |
KOINUMA, HIDEOMI;YAMAMOTO, YUKIO;MATSUMOTO, YUJI;TAKAHASHI, RYOTA |
分类号 |
C23C14/04;(IPC1-7):C23C14/04;C23C14/24 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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