<p>A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non-aqueous etch-resistant ink by ink jet printing to selected areas of the metal or alloy, exposing the etch-resistant ink to actinic radiation and/or particle beam radiation to effect polymerisation, removing exposed metal or alloy by a chemical etching process and then removing the polymerised etch-resistant ink by alkali wherein the etch-resistant ink is substantially solvent free and comprises the components: A) 30 to 90 parts acrylate functional monomers free from acid groups comprising mono or higher functionality wherein 5 - 95% by weight is one or more monofunctional monomers; B) 1 to 30 parts acrylate functional monomer containing one or more acid groups; C) 0 to 20 parts polymer or prepolymer; D) 0 to 20 parts radical initiator; E) 0 to 5 parts colorant; F) 0 to 5 parts surfactant; and wherein the ink has a viscosity of not greater than 30 cPs (mPa.s) at 40°C and all parts are by weight.</p>
申请公布号
WO2004026977(A1)
申请公布日期
2004.04.01
申请号
WO2003GB03697
申请日期
2003.08.22
申请人
AVECIA LIMITED;HOPPER, ALAN, JOHN;JAMES, MARK, ROBERT