Ester compounds, polymers, resist compositions and patterning process

摘要

An ester compound is new. An ester compound of formula (1) is new. [Image] A 1>polymerizable functional group having carbon-to-carbon bond; A 2>divalent group consisting of furandiyl, tetrahydrofurandiyl, or oxanorbornanediyl; R 1> and R 2>1-10C monovalent hydrocarbon; R 1>R 2>aliphatic hydrocarbon ring with the carbon atom to which they are bonded; R 3>H or 1-10C monovalent hydrocarbon which may contain a hetero atom. An independent claim is also included for a process for forming a resist pattern, comprising applying the resist composition onto a substrate to form a coating; heat treating the coating and exposing to high-energy radiation or electron beams through a photomask; and optionally heat treating the exposed coating and developing with a developer.