| 摘要 |
A substrate processing apparatus according to this invention includes a first chamber (1), a second chamber (3) which has a first valve (4) and a second valve (5), and communicates with the first chamber through said second valve, a thermoregulator which regulates a temperature of the substrate arranged in the second chamber, and a controller (30) which controls a time for which the thermoregulator regulates the temperature of the substrate. A substrate transferred to the second chamber through the first valve is temporally held in the second chamber, and then transferred to the first chamber through the second valve. <IMAGE> |
