发明名称 Multilayer structure used especially as a material of high relative permittivity
摘要 A multilayer structure, used especially as a material of high relative permittivity, includes a plurality of separate layers, each having a thickness of less than 500 Å, and based on hafnium dioxide (HfD2), zirconium dioxide (ZrO2) and alumina (Al2O3). In practice, the hafnium dioxide, zirconium dioxide and alumina layers form alloys of formula HfxZrAlyOz. Advantageously, the stoichiometry of the HfxZrAlyOz alloys varies from one layer to another.
申请公布号 US6713199(B2) 申请公布日期 2004.03.30
申请号 US20020329115 申请日期 2002.12.24
申请人 MEMSCAP 发明人 GIRARDIE LIONEL
分类号 C01G27/00;C23C14/08;C23C16/40;C23C16/44;C23C16/455;H01B3/12;H01G4/20;H01G4/33;H01L21/28;H01L21/316;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;H01L29/51;H01L29/78;(IPC1-7):B32B18/00 主分类号 C01G27/00
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