发明名称 Methodology for an assessment of the degree of barrier permeability at via bottom during electromigration using dissimilar barrier thickness
摘要 A system and method is disclosed for determining a barrier permeability at a via. A test structure is formed having a test barrier between two conductors. A substantially constant current is conducted through the test structure to measure the lifetime of the test structure. A barrier permeability value is assigned to the test barrier of the test structure based on the measured lifetime. The system also includes a test structure having a first conductor, a second conductor forming an interconnect, a no-flux barrier substantially impermeable to mass flux between the first and second conductor, a third conductor, and a test barrier between the second and third conductor, to be assessed for the barrier permeability value. A current source supplies the current through the test structure. A timer measures the lifetime of the test structure, and a processor determines the value of barrier permeability alpha of the test barrier based on the measured lifetime of the test structure.
申请公布号 US6714037(B1) 申请公布日期 2004.03.30
申请号 US20020179163 申请日期 2002.06.25
申请人 ADVANCED MICRO DEVICES, INC. 发明人 HAU-RIEGE CHRISTINE;MARATHE AMIT
分类号 G01R27/26;G01R31/28;H01L23/544;(IPC1-7):G01R27/26 主分类号 G01R27/26
代理机构 代理人
主权项
地址