发明名称 |
Methodology for an assessment of the degree of barrier permeability at via bottom during electromigration using dissimilar barrier thickness |
摘要 |
A system and method is disclosed for determining a barrier permeability at a via. A test structure is formed having a test barrier between two conductors. A substantially constant current is conducted through the test structure to measure the lifetime of the test structure. A barrier permeability value is assigned to the test barrier of the test structure based on the measured lifetime. The system also includes a test structure having a first conductor, a second conductor forming an interconnect, a no-flux barrier substantially impermeable to mass flux between the first and second conductor, a third conductor, and a test barrier between the second and third conductor, to be assessed for the barrier permeability value. A current source supplies the current through the test structure. A timer measures the lifetime of the test structure, and a processor determines the value of barrier permeability alpha of the test barrier based on the measured lifetime of the test structure.
|
申请公布号 |
US6714037(B1) |
申请公布日期 |
2004.03.30 |
申请号 |
US20020179163 |
申请日期 |
2002.06.25 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
HAU-RIEGE CHRISTINE;MARATHE AMIT |
分类号 |
G01R27/26;G01R31/28;H01L23/544;(IPC1-7):G01R27/26 |
主分类号 |
G01R27/26 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|