METHOD FOR FABRICATING RETARDATION PLATE AND RETARDATION PLATE FABRICATED THEREBY

摘要

PURPOSE: A method for fabricating a retardation plate and a retardation plate fabricated thereby are provided to preventing deterioration of a phase difference film and improve the productivity by performing accurately a patterning process to arrange 1/2 wavelength plates having phase difference functions in a predetermined interval. CONSTITUTION: Photoresist is coated on a transparent substrate(10). A photoresist pattern is formed on the transparent substrate(10) by performing an exposure process and a development process. A silicon oxide layer and a titanium oxide layer are sequentially stacked and deposited on the entire surface of the transparent substrate including the photoresist pattern by using a vacuum deposition method. A stacked and deposited structure(30) is formed by stacking and depositing the silicon oxide layer and the titanium oxide layer. The photoresist and the stacked and deposited structure(30) are stripped from the entire surface of the transparent substrate by using a high-pressure cleaning method.