LITHOGRAPHY TOOL HAVING VACUUM RETICLE LIBRARY COUPLED TO VACUUM CHAMBER

摘要

PURPOSE: Provided is a lithographic tool or method which increases multiple exposure throughput under an ultra violet environment by switching multiple reticles during exposure at a high speed. CONSTITUTION: The lithographic method comprises: a step(504) of processing reticles received from a vacuum input section in a vacuum processing section; a step(506) of storing the reticles in a vacuum library; a step(508) of indexing the stored reticles; and a step(510) of recovering a reticle requested to be used for exposing a pattern on a wafer from the vacuum library, based on the indexing step. The lithographic method may further comprise the step of transferring the reticles from atmospheric pressure to vacuum in the input section.