LOW PRE-HEAT PRESSURE CVD TIN PROCESS,申请号SG20010005258-传众专利搜索

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发明名称	LOW PRE-HEAT PRESSURE CVD TIN PROCESS
摘要
申请公布号	SG102635(A1)	申请公布日期	2004.03.26
申请号	SG20010005258	申请日期	2001.08.30
申请人	CHARTERED SEMICONDUCTOR MANUFACTURING LTD	发明人	CHIM-SENG, SEET;CHYI SHYUAM, CHERN;JUAN BOON, TAN
分类号	H01L21/285;H01L21/768	主分类号	H01L21/285
代理机构		代理人
主权项
地址

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