METHOD OF DEVICE INSPECTION AND APPARATUS FOR DEVICE INSPECTION

摘要

PURPOSE: A method of device inspection and an apparatus for device inspection are provided to enhance the efficiency in a device inspection process by using lithographic techniques. CONSTITUTION: An asymmetric marker is provided on a device to be inspected. The form of asymmetry of the marker is dependent upon the parameter to be inspected. The light is directed at the marker. A first measurement process is performed to measure a position of the marker via detection of diffracted light of a particular wavelength or diffraction angle. A second measurement process is performed to obtain the position of the marker via detection of diffracted light of a different wavelength or diffraction angle. The first and second measured positions are compared each other in order to determine a shift indicative of the degree of asymmetry of the marker.