发明名称 |
METHOD OF DEVICE INSPECTION AND APPARATUS FOR DEVICE INSPECTION |
摘要 |
PURPOSE: A method of device inspection and an apparatus for device inspection are provided to enhance the efficiency in a device inspection process by using lithographic techniques. CONSTITUTION: An asymmetric marker is provided on a device to be inspected. The form of asymmetry of the marker is dependent upon the parameter to be inspected. The light is directed at the marker. A first measurement process is performed to measure a position of the marker via detection of diffracted light of a particular wavelength or diffraction angle. A second measurement process is performed to obtain the position of the marker via detection of diffracted light of a different wavelength or diffraction angle. The first and second measured positions are compared each other in order to determine a shift indicative of the degree of asymmetry of the marker.
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申请公布号 |
KR20040025868(A) |
申请公布日期 |
2004.03.26 |
申请号 |
KR20030065314 |
申请日期 |
2003.09.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DENBOEF ARIE JEFFREY;BORNEBROEK FRANK;CRAMER HUGO AUGUSTINUS JOSEPH;DUSA MIRCEA;VANHAREN RICHARD JOHANNESFRANCISCUS;KIERS ANTOINE GASTON MARIE;KREUZER JUSTIN LLOYD;VANDERSCHAAR MAURITS;VANWIJNEN PAUL JACQUES;MOSEVER HARDUS CORNELIS;JAGER PIETER WILLEM HERMAN;VANDERLAAN HANS;LUEHRMANN PAUL FRANK |
分类号 |
G01B11/00;G01B11/02;G01B21/00;G02B5/18;G03F7/00;G03F7/20;G03F9/00;G03F9/02;H01L21/027;H01L21/3205;H01L21/68;H01L23/52;H01S3/00;(IPC1-7):H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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