MARKER STRUCTURE FOR OPTICAL ALIGNMENT OF SUBSTRATE, SUBSTRATE INCLUDING SUCH MARKER STRUCTURE, ALIGNMENT METHOD FOR ALIGNING TO SUCH MARKER STRUCTURE, AND LITHOGRAPHIC PROJECTION APPARATUS

摘要

PURPOSE: A marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus are provided to correct the phase depth by preventing negative interference within a diffraction pattern. CONSTITUTION: A marker structure includes a plurality of first structural elements and a plurality of second structural elements. The marker structure is used for directing light incident thereon to a sensor for determining alignment information. The alignment information includes information relating to a position of the substrate. The first structural element has a first reflecting surface on a first level and a second reflecting surface on a second level lower than the first level. The second structural element(106) is substantially non-reflecting, a separation between the first and second reflecting surfaces determining a phase depth condition for the detected light, and a recess(R1,R2,R3) provided in the second reflecting surface to modify the phase depth condition.