APPARATUS AND METHOD FOR FORMING THIN FILM

摘要

PURPOSE: An apparatus and a method for forming a thin film are provided to improve the uniformity of the thickness of the thin film by increasing the amount of gas from a center to an end of a substrate. CONSTITUTION: An apparatus for forming a thin film includes a gas supplying device, a power applying device, a vacuum container, and an exhausting device. The gas supplying device(2) includes a gas supply member(21) having a gas supply surface portion. The gas supply surface portion is opposed to a film-forming surface of an article to be film-covered disposed in the vacuum container(1). The power applying device(4) includes a power applying electrode(41) disposed in the vacuum container. The gas supply member has a plurality of gas supply holes(210a,210b) dispersedly formed at the gas supply surface portion. The power applying electrode is disposed in a surrounding region around a space between the article to be film-covered disposed in the vacuum container and the gas supply surface portion of the gas supply member opposed to the article.