| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing reticle which can simplify a reticle inspection process, can improve an effective working ratio of an EB plotting device and a reticle inspection device or the like, and can reduce a manufacturing cost by shortening time required for manufacturing the reticle by detecting a defect, such as a data transformation error included in an EB plotting data, before manufacturing the reticle. <P>SOLUTION: A CAD data 1, which is a reticle design data, is inputted in a first and a second data transformers 2 and 5. EB plotting data 3 and an inspection data 6 which are data transformed and outputted, are inputted in a data inspection device 8. Whether data transformation errors exist or not is verified before the EB plotting. When data transformation error is not detected by the data inspection device 8, a pattern is EB plotted and developed on a preplotting 9 reticle, based on the EB plotting data 3 by an EB plotting device 4. A manufactured reticle 11 after being developed is inspected by a reticle inspection device 7 using the inspection data 6. <P>COPYRIGHT: (C)2004,JPO |
