| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the occurrence of a unevenness, that is, nonuniformity of polishing on a polishing surface of a glass substrate after polishing in a single-side polishing process for polishing a surface of the glass substrate. <P>SOLUTION: This correcting method of a surface unevenness of a back pad 1 is used for a single-side polishing device for polishing a plate-like body surface by pressing the glass substrate held by the back pad 1 composed of a porous resin foaming sheet to polishing cloth 4 on a rotating polishing board by a pressurizing surface plate 5, and uniformly smoothes a back pad surface 1 by transferring smoothness of a smooth surface of a correcting plate 2 by polishing another one surface of the correcting plate 2 by fixing the smooth surface of the correcting plate 2 in close contact to the back pad 1 stuck to the under surface side of the pressurizing surface plate 5 by the single-side polishing device. <P>COPYRIGHT: (C)2004,JPO |
