| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a high numerical aperture and to improve yield by simplifying the process. <P>SOLUTION: A black matrix is formed over thin film transistors, gate lines and data lines by using an organic resin, and a first transparent electrode and a second transparent electrode are respectively formed on and below a color filter as a center. Since the color filter is formed directly on an array substrate in this way, it is not necessary to consider a stacking margin when the black matrix is designed and the numerical aperture is ensured. Further, the first transparent electrode formed under the color filter prevents chemicals for patterning the color filter from causing disconnection of the gate lines of the lower part. In addition, the black matrix serves not only as a means for interrupting light but also as a means for protecting the thin film transistor and, therefore, it is not necessary to form a special protective film requiring a mask process and, as a result, the process is simplified. <P>COPYRIGHT: (C)2004,JPO |
