发明名称 X-RAY MASK MANUFACTURING METHOD FOR X-RAY FLUOROSCOPIC INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an X-ray mask manufacturing method capable of easily fabricating X-ray masks to be installed in an X-ray fluoroscopic inspection device. SOLUTION: The X-ray mask manufacturing method includes three processes; one in which an X-ray generator 1 is installed in the condition that no specimen to be inspected 4 is placed, a grid plate is installed in a position where the X-ray mask 5 should originally be installed, and a grid image is generated by irradiating the grid plate with X-rays 2, the second in which a specimen 4 is placed and irradiated with X-rays 2 of low energy capable of making clear the contour so as to produce the contour image of the specimen 4, and the third in which the grid image and the contour image are composed to produce a grid-equipped contour image. The grid-equipped contour image obtained has such a structure that the grid image is composed on the contour image of the specimen 4, so that the X-ray mask covering the outside of the specimen contour can be fabricated by reference to the grid, and the mask manufacturing can be made with a high accuracy in the composed grid position because the grid plate is located in the mask position and a grid image is obtained and can be yielded accurately and easily without being influenced by an image distortion etc. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004093368(A) 申请公布日期 2004.03.25
申请号 JP20020255194 申请日期 2002.08.30
申请人 TOSHIBA IT & CONTROL SYSTEMS CORP 发明人 UYAMA KIICHIRO;KAMIYAMA TAMIHIKO;OTOMO KAZUYOSHI;TSURU SHOJI
分类号 G01N23/04;G01T1/00;G21K1/02;G21K3/00;(IPC1-7):G21K3/00 主分类号 G01N23/04
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