发明名称 Platinum alloy using electrochemical deposition
摘要 The present invention is directed to methods and compositions for depositing a noble metal alloy onto a microelectronic workpiece. In one particular aspect of the invention, a platinum metal alloy is electrochemically deposited on a surface of the workpiece from an acidic plating composition. The plated compositions when combined with high-k dielectric material are useful in capacitor structures.
申请公布号 US2004055895(A1) 申请公布日期 2004.03.25
申请号 US20030667802 申请日期 2003.09.22
申请人 SEMITOOL, INC. 发明人 HU ZHONGMIN;RITZDORF THOMAS L.;GRAHAM LYNDON W.
分类号 C25D7/12;H01L21/288;(IPC1-7):C25D3/50;C25D7/06;C25D3/56 主分类号 C25D7/12
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