发明名称 Test key for detecting electrical isolation between a word line and a deep trench capacitor in dram cells
摘要 A test key includes a substrate, a deep trench capacitor formed in the substrate, and at least one active region defined on the substrate. The active region comprises a first region, a second region and an ion well. A thermal oxide layer is formed in the first region. A top-thin oxide layer is formed in the second region. The second region overlaps with the deep trench capacitor. At least one word line partially overlapping with the top-thin oxide layer. The ion well is electrically connected with a polysilicon electrode of the deep trench capacitor. The thermal oxide layer within the first region does not overlap with any word line.
申请公布号 US2004056248(A1) 申请公布日期 2004.03.25
申请号 US20020065187 申请日期 2002.09.25
申请人 LIU CHIH-CHENG;LIAO WEI-WU;WANG CHUAN FU 发明人 LIU CHIH-CHENG;LIAO WEI-WU;WANG CHUAN FU
分类号 H01L23/544;(IPC1-7):H01L23/58 主分类号 H01L23/544
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