| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a means of carrying out the inspection of a fine defect at a high throughput and high reliability, and a manufacturing method of a device in which the yield of device manufacturing is improved by carrying out mask inspection by such a device. <P>SOLUTION: This electron beam device irradiates a stencil mask 800 with electron beams emitted from an electron gun 710, and the electron beams transmitted through the stencil mask 800 are amplified by an electron lens and detected by a detector having a plurality of picture elements, and an image of a testpiece is formed. <P>COPYRIGHT: (C)2004,JPO</p> |
