| 摘要 |
<P>PROBLEM TO BE SOLVED: To ensure no dependence of the intensity of reflected light on visual angle, to increase contrast, reliability and yield and to achieve a low production cost. <P>SOLUTION: The surface of a pixel capacity region on the surface of a substrate is made finely rugged by sandblast, a reflecting layer comprising an Al-Nd alloy is formed on the whole surface of the substrate, SiO<SB>2</SB>is laminated on the reflecting layer to form an interlayer insulating layer, and a transparent electrode is formed on the insulating layer. Since the reflecting layer is directly formed on the substrate, no undulation is ensured on the whole and dependence of the intensity of reflected light on visual angle is eliminated. The sandblast is more costwise advantageous than photoetching. Since a finely rugged region is only the pixel capacity region, light reflected on the outside of the pixel capacity region propagates in another direction and becomes invisible, that is, the reflecting layer functions as a black mask on the outside of the pixel capacity region. <P>COPYRIGHT: (C)2004,JPO |
