发明名称 PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL AND METHOD FOR DEVELOPING THE LITHOGRAPHIC PRINTING PLATE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate material which realizes decrease in the development sludge and decrease in the developer replenishing amount, and to provide a method for developing the lithographic printing plate material. <P>SOLUTION: The plate material has a photopolymerizable photosensitive layer containing a compound having at least an ethylenic unsaturated bond, an alkali-soluble polymer and a photopolymerization initiator, and an oxygen shielding layer containing polyvinylalcohol having &le;1,000 polymerization degree and an acetylene compound on a supporting body. The photosensitive lithographic printing plate material is treated with an alkali aqueous solution containing an amphoteric surfactant, anionic surfactant, chelating agent, aminoalcohol and a monofunctional or polyfunctional N-alkoxylated amine. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004094154(A) 申请公布日期 2004.03.25
申请号 JP20020258712 申请日期 2002.09.04
申请人 KONICA MINOLTA HOLDINGS INC 发明人 OTA TOMOHISA
分类号 G03F7/11;G03F7/00;G03F7/32 主分类号 G03F7/11
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