| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing device which is capable of developing a substrate as a work uniformly by restraining the air from mixing into a processing liquid. SOLUTION: The liquid processing device is equipped with a spin chuck 10 holding a glass substrate G; a nozzle head 20 which is provided with a liquid processing surface 21 that is kept separate from the surface of the glass substrate G by a certain gap and moves relatively parallel with the surface of the substrate G; a developing solution supply nozzle 22 which feeds the developing solution so as to form a belt-like flow of developing solution on the surface of the substrate G; suction nozzles 23 which are provided in parallel with the developing solution feed nozzle 22, suck up the developing solution supplied from the nozzle 22, and form the flow of developing solution on the surface of the substrate G, side rinsing nozzles 24 which are provided so as to feed rinsings onto the surface of the substrate G arranged to confront the developing solution feed nozzle 22, and sandwiching the suction nozzles 23 between them; and a run-up stage 40 which is provided with a flat plane that is located on the same plane with the surface of the substrate G held by the spin chuck 10, and confronted with the liquid processing device 21 so as to form a liquid film between itself and the liquid processing surface 21 of the nozzle head 20. COPYRIGHT: (C)2004,JPO |
