| 摘要 |
PROBLEM TO BE SOLVED: To provide a peeling liquid composition for photoresist, which exhibits superior peeling performance for a thick-film photoresist, does not solidify even at low temperature, and also has superior characteristics as to toxicity and environmental pollution. SOLUTION: The peeling liquid composition for photoresist is used to peel a patterned hardened body, formed of a photoresist on a substrate, off the substrate, and contains 60 to 95 wt.% N-methyl pyrrolidone, 1 to 20 wt.% diethanolamine and/or triethanolamine, 0.1 to 5 wt.% tetra(substituted)alkyl ammonium hydroxide, and 0.3 to 20 wt.% alcohol in 100 wt.% of the composition. COPYRIGHT: (C)2004,JPO |
