FLUORINE-CONTAINING COMPOUNDS WITH HIGH TRANSPARENCY IN THE VACUUM ULTRAVIOLET
摘要
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.
申请公布号
WO03077034(A3)
申请公布日期
2004.03.25
申请号
WO2003US07091
申请日期
2003.03.06
申请人
E.I. DU PONT DE NEMOURS AND COMPANY;FRENCH, ROGER, HARQUAIL;JONES, DAVID, JOSEPH;WHELAND, ROBERT, CLAYTON