| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which is capable of restraining the consumption of a developing solution, ensuring a sufficient developing time for a substrate without disturbing the flow of developing solution, and enabling the substrate to make a uniform developing process. SOLUTION: The developing treatment apparatus 1 is equipped with a nozzle head 20 provided with a liquid processing plane 21 which is capable of moving relatively parallel with the surface of the substrate G separate from the substrate G by a certain gap; two developing solution supply nozzles 22 which are provided in parallel with each other on the liquid processing plane 21 as separated from each other with a certain distance, and supply a developing solution so as to form the belt-like flow of developing solution on the surface of the glass substrate G; and suction nozzles 23 which are provided in parallel with the developing solution supply nozzles 22 sandwiching the two developing solution supply nozzles 22 between them, suck up the developing solution supplied from the developing solution supply nozzles 22, and form the flow of developing solution on the surface of the glass substrate G. The glass substrate G can be uniformly subjected to a developing process by the use of the developing treatment apparatus 1. COPYRIGHT: (C)2004,JPO |
