发明名称 SYSTEM AND METHOD FOR MONITORING THIN FILM DEPOSITION ON OPTICAL SUBSTRATES
摘要 By providing an optical monitor in a coating chamber (106) that can continuously monitor layer thickness of thin films deposited on optical substrates (114) during thin film deposition, optical coatings may be uniformly produced in high volumes. The optical monitor includes a light source (102), a light detector (104), a control panel, and a computer. The light source generates a light beam that is directed into the coating chamber towards the optical substrates which are mounted on a holder (116), e.g. a dual axis planetary system. when the light beam hits hte optical substra tes, an mount of light passes through. The amount of light that passes through the optical substrates is representative of the thin filim layr thickness. The detector detects this amount of light and generates a current signal. The control panel converts the current signal to a voltage singnal and provides transmission data to the computer . The computer calculates the film thickness using the transmission data and provides correction information.
申请公布号 WO2004025219(A1) 申请公布日期 2004.03.25
申请号 WO2003US28647 申请日期 2003.09.10
申请人 HONEYWELL INTERNATIONAL INC. 发明人 ANDERSON, CARL, D.
分类号 C23C14/54;G01B11/06 主分类号 C23C14/54
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