| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus and a cleaning method of the substrate treatment apparatus in which active species are suppressed from being deactivated. SOLUTION: A film forming apparatus 1 is equipped with a treatment chamber 2 and an external chamber 51 for generating F radicals. To the treatment chamber 2 and the external chamber 51, transfer piping 71 is connected via a gate valve 60. The transfer piping 71 is equipped with a channel 71a of which the cross-sectional area is increased gradually from an inflow 71b to an outflow 71c. COPYRIGHT: (C)2004,JPO
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