发明名称 VACUUM DEPOSITION SYSTEM AND DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vacuum deposition system which can prevent the wear of electrodes for generating discharge etc., by reducing the voltage to generate plasma discharge. SOLUTION: The vacuum deposition system 30 is provided with a vacuum chamber 1, a plasma discharge electrode 2 also functioning as a substrate holder for holding a substrate, a power unit 15 for supplying electric power to cause discharge in the vacuum chamber 1 through the electrode 2, a discharge start electrode 21 and a discharge start electrode driving mechanism 25 for driving the electrode 21. The electrode 21 is arranged in an operative position and is kept at the same potential as the electrode 2 until the plasma discharge is started. When the plasma discharge by the electrode 2 is started, the plasma discharge electrode is retreated from the operative position. As a result, the voltage to start the discharge in the vacuum chamber 1 can be lowered and the voltage to generate the plasma discharge can be lowered. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004091861(A) 申请公布日期 2004.03.25
申请号 JP20020255092 申请日期 2002.08.30
申请人 SHIN MEIWA IND CO LTD 发明人 KAMIYA KAZUO
分类号 C23C14/32;(IPC1-7):C23C14/32 主分类号 C23C14/32
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