Method of depicting a pattern with electron beam and method of producing disc-like substrate carrying thereon a pattern depicted with electron beam

摘要

A resist layer formed on a disc-like substrate is exposed to an electron beam in a desired pattern to depict a desired pattern on the resist layer. The desired pattern is depicted by oscillating back and forth, in directions intersecting the circumferential direction of the disc-like substrate, an electron beam smaller in its beam diameter than the minimum width of the pattern while rotating the substrate in one direction.