APPARATUS AND METHOD FOR SUPPLY PHOTORESIST IN PHOTOLITHOGRAPHY PROCESS

摘要

PURPOSE: An apparatus and a method for supplying a photoresist in a photolithography process are provided to reduce errors of the fabrication process and enhance the productivity by preventing the generation of fine air bubbles in the process for injecting the photoresist on a wafer. CONSTITUTION: An apparatus for supplying a photoresist in a photolithography process includes a chuck(22), a nozzle(24), and a control unit. The chuck(22) is used for absorbing and fixing a bottom face of a wafer(W) and rotating selectively the absorbed wafer(W). The nozzle(24) is used for injecting photoresist on the surface of the wafer loaded on the chuck(22). The control unit controls a driving operation of the chuck and a driving operation of the nozzle.