发明名称 ALIGNMENT TOOL, LITHOGRAPHY EQUIPMENT, METHOD FOR ALIGNMENT, DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an alignment tool which obtains a variable focal depth of an alignment beam. SOLUTION: An extra optical element is put across an alignment beam during alignment. If an alignment mark on a substrate is at a focal length different from that of the front surface of the substrate, the optical element is adjusted to focus the alignment beam on the alignment mark on the substrate. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004096109(A) 申请公布日期 2004.03.25
申请号 JP20030303120 申请日期 2003.08.27
申请人 ASML NETHERLANDS BV 发明人 LOF JOERI;BIJNEN FRANSISCUS GODEFRIDUS CASPER;VAN BUEL HENRICUS WILHELMUS MARIA;GUI CHENG-QUN
分类号 G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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