发明名称 |
ALIGNMENT TOOL, LITHOGRAPHY EQUIPMENT, METHOD FOR ALIGNMENT, DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an alignment tool which obtains a variable focal depth of an alignment beam. SOLUTION: An extra optical element is put across an alignment beam during alignment. If an alignment mark on a substrate is at a focal length different from that of the front surface of the substrate, the optical element is adjusted to focus the alignment beam on the alignment mark on the substrate. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004096109(A) |
申请公布日期 |
2004.03.25 |
申请号 |
JP20030303120 |
申请日期 |
2003.08.27 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
LOF JOERI;BIJNEN FRANSISCUS GODEFRIDUS CASPER;VAN BUEL HENRICUS WILHELMUS MARIA;GUI CHENG-QUN |
分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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