METHOD OF DIFFUSING IMPURITY, AND SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which allows efficient diffusion of only a specified impurity element. SOLUTION: The method of manufacturing a semiconductor device comprises processes of introducing a prescribed impurity element into a semiconductor substrate, forming an impurity diffused region in the semiconductor substrate by radiating the light of a frequency resonating the characteristic frequency of the impurity element to diffuse the impurity element, and forming a semiconductor element on the semiconductor substrate. COPYRIGHT: (C)2004,JPO