发明名称 ELECTRODE FORMING METHOD OF SPHERICAL SEMICONDUCTOR ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To form a minute electrode, having small ohmic contact resistance and inherent resistance, on the minute curved surface or plane of the surface of a minute spherical semiconductor element with high accuracy and good productivity without generating internal short-circuit. <P>SOLUTION: At least one electrode is formed by applying conductive ink on the surface of the spherical semiconductor element through ink jet system and effecting heat treatment. For instance, a first electrode is formed on the exposed surface of a first spherical conductive semiconductor and a second electrode is formed on the outer peripheral surface of a second conductive semiconductor layer for the spherical semiconductor element employed mainly for photoelectric conversion respectively. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004095826(A) 申请公布日期 2004.03.25
申请号 JP20020254454 申请日期 2002.08.30
申请人 CLEAN VENTURE 21:KK 发明人 MUROZONO MIKIO;HIROSHIMA YOSHIMITSU
分类号 H01L21/288;H01L21/60;H01L23/52;H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L21/288
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