发明名称 DEVICE AND METHOD FOR FORMING FILM, AND PROTECTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for forming a metal oxide film, and especially a protective film for a plasma display panel by forming a thin film for controlling and improving the property of a metal oxide. SOLUTION: This film formation method forms a thin film of carbon fluoride on a metal oxide-film surface for improving secondary-electron-emission efficiency of the thin film and improves the property of a protective film using a water repellent effect. The conductivity and the temperature characteristic of the protective layer of an alternated type plasma display panel are controlled for improving secondary-electron-emission efficiency to greatly improve the throughput of panel manufacture. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004095452(A) 申请公布日期 2004.03.25
申请号 JP20020257252 申请日期 2002.09.03
申请人 HITACHI LTD 发明人 MIYAKE TATSUYA;KATO AKIRA;YAJIMA YUSUKE;KAJIYAMA HIROSHI
分类号 C23C14/06;C23C16/30;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):H01J9/02;H01J11/02 主分类号 C23C14/06
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