发明名称 |
DEVICE AND METHOD FOR FORMING FILM, AND PROTECTIVE FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for forming a metal oxide film, and especially a protective film for a plasma display panel by forming a thin film for controlling and improving the property of a metal oxide. SOLUTION: This film formation method forms a thin film of carbon fluoride on a metal oxide-film surface for improving secondary-electron-emission efficiency of the thin film and improves the property of a protective film using a water repellent effect. The conductivity and the temperature characteristic of the protective layer of an alternated type plasma display panel are controlled for improving secondary-electron-emission efficiency to greatly improve the throughput of panel manufacture. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004095452(A) |
申请公布日期 |
2004.03.25 |
申请号 |
JP20020257252 |
申请日期 |
2002.09.03 |
申请人 |
HITACHI LTD |
发明人 |
MIYAKE TATSUYA;KATO AKIRA;YAJIMA YUSUKE;KAJIYAMA HIROSHI |
分类号 |
C23C14/06;C23C16/30;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):H01J9/02;H01J11/02 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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