| 发明名称 |
METHOD AND APPARATUS FOR TUNING AN RF MATCHING NETWORK IN A PLASMA ENHANCED SEMICONDUCTOR WAFER PROCESSING SYSTEM |
| 摘要 |
A method and apparatus for operating a matching network within a plasma enhanced semiconductor wafer processing system that uses pulsed power to facilitate plasma processing. |
| 申请公布号 |
WO03090351(A3) |
申请公布日期 |
2004.03.25 |
| 申请号 |
WO2003US09937 |
申请日期 |
2003.03.31 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
TODOROW, VALENTIN;HOLLAND, JOHN;GANI, NICOLAS |
| 分类号 |
H01J37/32;H03H7/40 |
主分类号 |
H01J37/32 |
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