发明名称 METHOD OF CREATING NANOPARTICLE AND ELECTROLESS PLATING USING IRRADIATION OF SYNCHROTRON X-RAY
摘要 The present invention relates to methods for nanoparticle production and electroless plating, which comprise immersing an object in an aqueous solution containing a metal salt and a reducing agent, and irradiating the aqueous solution with X-ray. The X-ray is high-transmission X-ray, such as synchrotron X-ray. As a result, the nanoparticles can be produced and the formation of an electroless plating film on the object surface can be effectively achieved. The object may be catalytic or non-catalytic at least at its surface. The electroless plating method of the present invention allows plating of the object at room temperature without a separate activation process, even if the object is non-catalytic.
申请公布号 WO2004024986(A1) 申请公布日期 2004.03.25
申请号 WO2002KR01382 申请日期 2002.07.23
申请人 POSTECH FOUNDATION;JE, JUNG-HO;LEE, HO-JUNE;HWU, YEUKUANG;TSAI, WEN-LI 发明人 JE, JUNG-HO;LEE, HO-JUNE;HWU, YEUKUANG;TSAI, WEN-LI
分类号 C23C18/14;C23C18/34 主分类号 C23C18/14
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