| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for cleanly washing the surface of a substrate by removing sticking foreign materials without damaging the surface of the substrate to be washed. SOLUTION: In the method for washing the surface of a substrate, solid particulates 3 together with a transportation gas 4 are injected and made to collide with the surface of the substrate 1 to remove sticking foreign matters on the surface of the substrate 1 and, at a position different from the position of injecting the solid particulates 3, the surface of the substrate 1 is heated. COPYRIGHT: (C)2004,JPO
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