INSPECTION METHOD OF EXPOSURE DEVICE AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To inspect the illumination shaft dislocation of an exposure device without much costing. SOLUTION: A photomask 1 sets the surface of a photosensitive substrate 18 and the face of a secondary light source 14 in an optically conjugate state. A region which does not comprise the end of a pupil of a projection optical system 17 and a region which is not overlapped with the region and which comprises the end of the pupil of the projection optical system 17 are illuminated in such a state. The photosensitive substrate 18 is exposed and the illumination shaft dislocation is inspected based on a pattern obtained by developing the photosensitive substrate 18. COPYRIGHT: (C)2004,JPO