发明名称 Self-aligned split-gate NAND flash memory and fabrication process
摘要 Self-aligned split-gate NAND flash memory cell array and method of fabrication in which a series of self-aligned split cells are formed between a bit line diffusion and a common source diffusion. Each cell has control and floating gates which are stacked and self-aligned with each other, and a third gate which is split from but self-aligned with the other two. In some disclosed embodiments, the split gates are utilized as erase gates, and in others they are utilized as select gates. The memory cells are substantially smaller than prior art cells, and the array is biased so that all of the memory cells in it can be erased simultaneously, while programming is bit selectable.
申请公布号 US2004057286(A1) 申请公布日期 2004.03.25
申请号 US20020251664 申请日期 2002.09.19
申请人 CHEN CHIOU-FENG;FAN DER-TSYR;LU JUNG-CHANG;TUNTASOOD PRATEEP 发明人 CHEN CHIOU-FENG;FAN DER-TSYR;LU JUNG-CHANG;TUNTASOOD PRATEEP
分类号 G11C16/04;H01L21/8247;H01L27/115;(IPC1-7):G11C16/04 主分类号 G11C16/04
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