| 摘要 |
A method is provided for fabricating a microstructure using maskless lithography. A first layer is provided in a spaced relationship to a base layer so as to define a construction cavity therebetween. The first layer has a passageway therethrough that communicates with the construction cavity. The construction cavity is filled with material and a polymerizing agent is directed towards a portion of the material so as to polymerize the same. The polymerized material defines a channel network and the non-polymerized material is flushed from the channel network.
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