发明名称 Solid material gasification method, thin film formation process and apparatus
摘要 Solid material gasification method comprises a solution preparation step wherein a first solid material is dissolved in a solvent to prepare a gasification solution, a solvent removal step wherein a second solid material is separated by removing the solvent used to prepare the gasification solution from that solution, and a solid sublimation step wherein the second solid material is gasified by sublimation.
申请公布号 US2004058510(A1) 申请公布日期 2004.03.25
申请号 US20030662474 申请日期 2003.09.16
申请人 FUJITSU LIMITED 发明人 HYODO HIROYUKI;YAMAWAKI HIDEKI;MARUYAMA KENJI;HIDA MASAHARU
分类号 B01J19/00;C23C16/448;H01L21/31;H01L21/76;(IPC1-7):H01L21/76 主分类号 B01J19/00
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