发明名称 |
Solid material gasification method, thin film formation process and apparatus |
摘要 |
Solid material gasification method comprises a solution preparation step wherein a first solid material is dissolved in a solvent to prepare a gasification solution, a solvent removal step wherein a second solid material is separated by removing the solvent used to prepare the gasification solution from that solution, and a solid sublimation step wherein the second solid material is gasified by sublimation.
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申请公布号 |
US2004058510(A1) |
申请公布日期 |
2004.03.25 |
申请号 |
US20030662474 |
申请日期 |
2003.09.16 |
申请人 |
FUJITSU LIMITED |
发明人 |
HYODO HIROYUKI;YAMAWAKI HIDEKI;MARUYAMA KENJI;HIDA MASAHARU |
分类号 |
B01J19/00;C23C16/448;H01L21/31;H01L21/76;(IPC1-7):H01L21/76 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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