发明名称 ORGANIC COMPOUND FOR CVD RAW MATERIAL AND PROCESS FOR PRODUCING THIN FILM OF METAL OR METAL COMPOUND WITH THE USE OF ORGANIC COMPOUND
摘要 <p>An organic compound for CVD raw material, comprising a first organometallic compound having a metal atom coordinating with ligands and, mixed therewith, at least one second organometallic compound comprising as a center atom the same metal atom as in the first organometallic compound, the center atom coordinating with different ligands, which second organometallic compound exhibits decomposition behavior different from that of the fist organometallic compound. In particular, raw material for CVD realizing characteristics of handling easiness and thin film adherence whose simultaneous achievement has been difficult can be produced by selecting a cyclopentadiene complex or derivative thereof as the first organometallic compound and selecting a beta-diketonate compound as the second organometallic compound and by mixing these.</p>
申请公布号 WO2004024980(A1) 申请公布日期 2004.03.25
申请号 WO2003JP09861 申请日期 2003.08.04
申请人 TANAKA KIKINZOKU KOGYO K.K.;SAITO, MASAYUKI 发明人 SAITO, MASAYUKI
分类号 C07C49/92;C07F1/10;C07F1/12;C07F15/00;C07F17/00;C07F17/02;C23C16/18;C23C16/448;(IPC1-7):C23C16/18 主分类号 C07C49/92
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